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Magnetron sputtering system

Brief description of equipment

Two chamber sputtering system for the deposition of oxide thin films.

One of the chambers is equipped with inverted cylindrical magnetron for the realization of YBCO films; the other is dedicated to CeO2 and MgO


Contact person(s)
Daniela Stornaiuolo

University of Naples “Federico II”, Napoli, Italy

Related publications

Resolving the effects of frequency-dependent damping and quantum phase diffusion in YBa2Cu3O7−x Josephson junctions, Physical Review B, 87, 134517 (2013)

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