Brief description of equipment
In situ visualization of electromigration process in a scanning electron microscopy chamber
Contact person(s)
Alejandro Silhanek
Université de Liège
Related publications
In situ tailoring of superconducting junctions via electro-annealing
J. Lombardo, Ž. L. Jelić, X. D. A. Baumans, J. E. Scheerder, J. P. Nacenta, V. V. Moshchalkov, J. Van de Vondel, R. B. G. Kramer, M. V. Milosevic and A. V. Silhanek.
Nanoscale 10, 1987 (2018).
Healing Effect of Controlled Anti-Electromigration on Conventional and High-Tc Superconducting Nanowires
X. D. A. Baumans, J. Lombardo, J. Brisbois, G. Shaw, V. S. Zharinov, G. He, H. Yu, J. Yuan, B. Zhu, K. Jin, R. B. G. Kramer, J. Van de Vondel and A. V. Silhanek.
Small 13, 1700384 (2017).
Thermal and quantum depletion of superconductivity in narrow junctions created by controlled electromigration
X. D. A. Baumans, D. Cerbu, O.-A. Adami, V. S. Zharinov, N. Verellen, G. Papari, J. E. Scheerder, G. Zhang, V. V. Moshchalkov, A. V. Silhanek and J. Van de Vondel.
Nat. Commun. 7, 10560 (2016).