UHV Thin Film Cluster Tool

Brief description of equipment

UHV System providing Pulsed Laser Deposition (PLD), magnetron sputtering and electron beam evaporation and ion milling (Ar, O or SF₆) in separate chambers with in-situ sample transfer.

Contact person(s)

Markus Turad, Ronny Löffler

University of Tübingen
Center for Light-Matter Interaction, Sensors & Analytics (LISA+)

Related publications

S. Scharinger et al., Magnetic field dependence of the critical current in YBa₂Cu₃O_7-δ/Au/Nb ramp-zigzag Josephson junctions, Phys. Rev. B 86, 144531 (2012).

J. Tomaschko et al., Properties of the electron-doped infinite-layer superconductor Sr_1-xLa_xCuO₂ epitaxially grown by pulsed laser deposition, Phys. Rev. B 85, 024519 (2012).